Semiconductor sector
Constructed from ultra-clean materials such as PVDF, PFA, and PP, ALFA PUMPS prevent metal ion contamination, ensuring process integrity. Their smooth internal surfaces and precision engineering maintain chemical purity and minimize particle generation.
High-Tech Applications
With chemical resistance, temperature stability, and leak-free sealing options, ALFA PUMPS are trusted for cleanroom operations where equipment reliability and cleanliness are non-negotiable.
Wafer Cleaning & Etching
Critical stages in chip production involve aggressive acids and solvents.
PVDF and PFA materials ensure ultra-pure chemical transfer.
Resistant to acids like HF, HCl, H₂SO₄, and oxidizers.
Stable performance in high-temperature baths.
Chemical Mechanical Planarization (CMP)
CMP slurries require precise flow control without contamination.
UHMW-PE construction for abrasion resistance.
Smooth-flow hydraulics for uniform slurry distribution.
Long service life under continuous operation.
Ultra-Pure Water (UPW) Systems
UPW is essential for rinsing and cleaning in semiconductor plants.
Non-metallic wetted parts eliminate metal ion leaching.
Maintains water purity at parts-per-billion levels.
Energy-efficient operation for high-volume supply.